基于叉指结构的平面分形电容研究-《集美大学学报（自然科学版）》

文章信息/Info

作者:: 徐文彬1; 庄铭杰1; 王德苗2; (1.集美大学信息工程学院,福建厦门 361021;2.浙江大学信息与电子工程系,浙江杭州 310027)

Author(s):: XU Wen-bin1; ZHUANG Ming-jie1; WANG De-miao2; (1.School of Information Engineering,Jimei University,Xiamen 361021,China;2.Department of Information Science & Electronics Engineering,Zhejiang University,Hangzhou 310027,China)

Keywords:: integrated thin film capacitors; interdigital capacitors; fractal

摘要:: ］以基于叉指结构的平面分形电容为研究对象，电容由激光刻蚀法制得，在测得其S参数后，利用ADS仿真工具进行了一阶等效电路参数提取及分析.结果表明，随着共面叉指电极间距的相对减小，电极间的耦合增大，相应的寄生电感也增大；而分形设计可以在保证电极间距不变的情况下，改善电容的工作稳定性.最后制得的分形平面电容的电容值在1~7 pF之间，电容稳定工作频率可达2.5 GHz以上，显示了较好的可调性和稳定性

Abstract:: This paper studied the fractal planar capacitors based on interdigital structures.The capacitors were made by laser techniques.After the S parameters measurement,ADS simulation was adopted to analyze the corresponding first-order equivalent circuit parameters.It was showed that with the relative decrease of the gap between coplanar electrodes,the coupling between electrodes was enhanced,and a larger parasitical inductance parameter was expected.On the other hand,fractal design was found beneficial for the improvement of the capacitors stability.The capacitance value of the final fractal structure planar capacitor was between 1~7 pF and its stable operating frequency could be lager than 2.5 GHz,suggesting its good adjustability and stability.