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[1]杨兰,郭太良.场发射FED器件MIM结构Ta-Ta2O5 -Al薄膜的制备及性能[J].集美大学学报(自然科学版),2011,16(6):476-480.
　YANG LanGUO Tai-liang.Preparation and Performance of the Ta-Ta2O5 -Al Composite Filmsin the MIM Structure?s FED Component[J].Journal of Jimei University,2011,16(6):476-480.
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场发射FED器件MIM结构Ta-Ta2O5 -Al薄膜的制备及性能(PDF)
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《集美大学学报（自然科学版）》[ISSN:1007-7405/CN:35-1186/N]

卷:
第16卷
期数:
2011年第6期
页码:
476-480
栏目:
数理科学与信息工程
出版日期:
2011-11-25

文章信息/Info

Title:
Preparation and Performance of the Ta-Ta2O5 -Al Composite Filmsin the MIM Structure?s FED Component
作者:
杨兰1; 郭太良2
(1.集美大学理学院,福建 厦门 361021;2.福州大学物理与信息工程学院,福建 福州 350108)
Author(s):
YANG Lan1GUO Tai-liang2
(1.School of Science,Jimei University,Xiamen 361021,China;2.College of Physics and Information Engineering, Fuzhou University,Fuzhou 350108,China)
关键词:
阳极氧化; Ta2O5薄膜; MIM结构; 非晶态
Keywords:
anodic oxidation; Ta2O5 film; MIM structure; amorphous
分类号:
-
DOI:
-
文献标志码:
-
摘要:
利用直流磁控溅射Ta膜和阳极氧化法制备Ta2O5薄膜，能谱分析（EDS）和X射线衍射仪（XRD）研究表明，在H3PO4电解液中添加少量的乙二醇制备的Ta2O5薄膜，呈非晶态，没有β-Ta2O5晶相出现.利用电击穿场强测试系统研究Ta -Ta2O5 -Al复合薄膜制备FED器件（MIM结构）的绝缘性，证明采用磁控溅射和阳极氧化法成功制备了漏电流密度低、耐击穿场强高的Ta2O5薄膜
Abstract:
The direct-current megnetron sputtering and the anodic oxidation process were adopted to prepare the Ta2O5 thin film.In the anodic oxidation process，a soupcon of glycol was appended in H3PO4 electrolyte for the preparation of the Ta2O5 film.The composite of the Ta2O5 thin film was characterized by X-ray diffractions(XRD)and pectroscope(EDS),respectively.The results indicated the Ta2O5 film was amorphous and there was no β-Ta2O5 srystalline phase.The electrical breakdown field intensity test system was employed to study the insulation performance of the Ta-Ta2O5 -Al composite films(MIM structure)in the FED component.The results indicated that the Ta-Ta2O5 -Al composite films had higher breakdown field intensity

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更新日期/Last Update: 2018-06-13